| 1989 | Kazuo Matsubara starts initial foundation at Nakakuze in Kyoto. |
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| 1989 | Developed ECR dry etching equipment |
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| 1992 | Developed metal etching equipment |
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| 1993 | Developed plasma CVD equipment |
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| 1996 | Manufacture and sale of RF dry etching equipment for LCDs |
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| 1998 | Supplied ICP dry etching equipment (370 x 470) to Japanese users |
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| 2000 | Moved head office to Daigo, Fushimi-ku, Kyoto |
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| 2001 | Established a low-temperature process for carbon nanotubes |
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| 2002 | Supplied ICP-CVD organic EL protective film to Taiwanese users |
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| 2003 | Moved to Kamitoba, Minami Ward, Kyoto City |
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| 2004 | Established a process center in Hadano, Kanagawa Prefecture |
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| 2005 | Construction of factory and clean room at R&D Center, Kamitoba, Kyoto City |
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| 2006 | Developed metal CVD equipment |
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| 2008 | Developed the industry's first ICP-CVD roll-to-roll equipment |
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| 2010 | Large CVD 800 x 800 Domestic user sales start |
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| 2012 | Released gas barrier film for organic EL |
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| 2015 | Developed PEGASUS-300 |
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| 2017 | Developed room temperature bonding equipment |
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| 2020 | Received orders for 300mm gate insulating film CVD equipment from overseas manufacturers |
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| 2021 | Established a joint venture in Beijin |
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